Effect of aluminum contents on sputter deposited CrAlN thin films

A. Vyas, Z. F. Zhou, Y. G. Shen

Research output: Contribution to journalConference articlepeer-review

13 Citations (Scopus)


Pure CrN and CrAlN films with varied Al concentrations were prepared onto Si(100) substrates by an unbalanced reactive dc-magnetron sputtering system. The crystal structure, chemical states, and microstructure of the films were characterized by X-ray diffraction, X-ray photoelectron microscopy, transmission electron microscopy whereas mechanical properties were determined by nano-indentation measurements. XRD results showed a prominent (200) reflection in both CrN and CrAlN films. Results demonstrate that CrAlN films formed a solid solution and doping of Al atoms replace the Cr atoms affecting the lattice parameter and crystallization of the films. All Al doped films were of B1 NaCl-type structure, demonstrating that CrAlN films primarily crystallized in cubic structure. Microstructural investigation by TEM for a CrAlN film containing Al content of 24.1 at.%, revealed that there exists an amorphous/nanocrystalline domains (grains of about ∼ 11 nm) and hardness increases 22% when compared with pure CrN film.

Original languageEnglish
Article number012079
JournalIOP Conference Series: Materials Science and Engineering
Issue number1
Publication statusPublished - 19 Feb 2018
Event2017 International Conference on Mechanical Engineering and Applied Composite Materials, MEACM 2017 - Hong Kong, China
Duration: 23 Nov 201724 Nov 2017


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