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Effect of aluminum contents on sputter deposited CrAlN thin films
A. Vyas
, Z. F. Zhou
, Y. G. Shen
Division of Science, Engineering and Health Studies (SEHS)
Research output
:
Contribution to journal
›
Conference article
›
peer-review
20
Citations (Scopus)
Overview
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Engineering
Transmissions
100%
Ray Diffraction
100%
Lattice Parameter
100%
Magnetron
100%
Hardness Increase
100%
Nanocrystalline
100%
Structure Type
100%
Crystal Structure
100%
Photoelectron
100%
Indentation
100%
Microstructure
100%
Al Content
100%
Solid Solution
100%
Thin Films
100%
Keyphrases
Sputter-deposited
100%
CrAlN Film
100%
CrAlN Thin Films
100%
Aluminum Content
100%
CrN Film
60%
Hardness Increase
20%
Microstructural Investigation
20%
Crystallization
20%
Sodium Chloride
20%
Cr Atom
20%
Al Concentration
20%
Al Content
20%
Chemical Microstructure
20%
Nanoindentation Measurement
20%
X Ray Diffraction
20%
Doped Films
20%
Si (100) Substrate
20%
Amorphous-nanocrystalline
20%
Al-doped
20%
Lattice Parameter
20%
Mechanical Properties
20%
X-ray Photoelectron Microscopy
20%
Chemical State
20%
DC Reactive Magnetron Sputtering
20%
Al Atom
20%
Magnetron Sputtering System
20%
Cubic Structure
20%
Transmission Electron Microscopy
20%
Solid Solution
20%
Material Science
Thin Films
100%
Aluminum
100%
Film
100%
X-Ray Diffraction
22%
Solid Solution
11%
Transmission Electron Microscopy
11%
Nanocrystalline
11%
Chemical State
11%
Nanoindentation
11%
Amorphous Material
11%
Lattice Constant
11%
Crystal Structure
11%
Magnetron Sputtering
11%