Keyphrases
AFM Measurements
50%
Bilayer Thickness
50%
Closed Field Unbalanced Magnetron Sputtering (CFUBMS)
50%
CNx Film
50%
Cr2N
100%
Experimental Parameters
50%
High-speed Steel Substrate
50%
Improved Mechanical Properties
50%
Magnetron Sputtering
100%
Maximum Hardness
50%
Mechanical Properties
50%
Microstructure
50%
Mixed Structure
50%
Multilayer Film
100%
Multilayer Thin Films
50%
Multilayered Films
50%
Nanoindentation Measurement
50%
Nanostructures
100%
Negative Substrate Bias
50%
Phase Content
50%
Phase Formation
50%
Root Mean Square
100%
Rotation Rate
50%
Si(111)
50%
Structural Properties
50%
Structure Phase
50%
Substrate Bias Voltage
50%
Substrate Rotation
50%
Surface Roughness
50%
Engineering
Bias Voltage
50%
Experimental Parameter
50%
High-Speed Steel
50%
Layer Thickness
50%
Magnetron
100%
Microstructure
50%
Multilayer Film
100%
Nanoscale
50%
Phase Formation
50%
Phase Structure
50%
Root Mean Square
50%
Root Mean Square Value
50%
Rotation Rate
50%
Substrate Bias
50%
Thin Films
50%
Material Science
Amorphous Material
33%
Film
100%
High Speed Steel
33%
Magnetron Sputtering
100%
Multilayer Film
100%
Nanoindentation
33%
Phase Structure
33%
Surface Roughness
33%
Thin Films
33%
Agricultural and Biological Sciences
Chemical Engineering
Magnetron Sputtering
100%