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Nano-structured CrN/CN
x
multilayer films
A. Vyas
, Y. G. Shen
, Z. F. Zhou
, K. Y. Li
Division of Science, Engineering and Health Studies (SEHS)
Research output
:
Contribution to journal
›
Article
›
peer-review
1
Citation (Scopus)
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x
multilayer films'. Together they form a unique fingerprint.
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Keyphrases
Nanoindentation Measurement
100%
Atomic Force Microscopy
100%
Nanostructures
100%
Multilayer Film
100%
Root Mean Square
100%
Cr2N
100%
Surface Roughness
50%
X Ray Diffraction
50%
Si (100) Substrate
50%
Mechanical Properties
50%
Microstructure
50%
CNx Film
50%
Closed Field Unbalanced Magnetron Sputtering (CFUBMS)
50%
Maximum Hardness
50%
Bilayer Thickness
50%
Structural Properties
50%
Experimental Parameters
50%
Substrate Rotation
50%
Rotation Rate
50%
Negative Substrate Bias
50%
Multilayered Films
50%
Improved Mechanical Properties
50%
Transmission Electron Microscope
50%
Phase Formation
50%
Mixed Structure
50%
Structure Phase
50%
Substrate Bias Voltage
50%
Phase Content
50%
Engineering
Multilayer Film
100%
Atomic Force Microscopy
100%
Transmissions
50%
Ray Diffraction
50%
Magnetron
50%
Microstructure
50%
Layer Thickness
50%
Experimental Parameter
50%
Root Mean Square
50%
Nanoscale
50%
Bias Voltage
50%
Root Mean Square Value
50%
Rotation Rate
50%
Substrate Bias
50%
Phase Structure
50%
Phase Formation
50%
Physics
Atomic Force Microscopy
100%
Nanoindentation
100%
X Ray Diffraction
50%
Magnetron Sputtering
50%
Surface Roughness
50%
Nanoscale
50%
Electron Microscope
50%
Material Science
Film
100%
Multilayer Film
100%
Nanoindentation
66%
X-Ray Diffraction
33%
Amorphous Material
33%
Magnetron Sputtering
33%
Surface Roughness
33%
Phase Structure
33%