Synthesis and characterization of CN_x/TiN multilayers on Si(100) substrates

Keyphrases

• Si (100) Substrate 100%
• Bilayer Thickness 100%
• Surface Roughness 75%
• Root Mean Square 75%
• Microhardness 50%
• Substrate Rotation 50%
• X Ray Diffraction 25%
• Chemical State 25%
• Transmission Electron Microscopy 25%
• Rutile 25%
• X-ray Photoelectron Spectroscopy 25%
• Pin-on-disc Test 25%
• Atomic Force Microscopy 25%
• Drying Conditions 25%
• Compressive Stress 25%
• Closed Field Unbalanced Magnetron Sputtering (CFUBMS) 25%
• Deposition Process 25%
• Maximum Hardness 25%
• TiN Layer 25%
• Magnetron Sputtering Deposition 25%
• Low Friction Coefficient 25%
• Multilayer Structure 25%
• Bonding State 25%
• High Angle 25%
• Multilayer Coatings 25%
• Diffraction Angle 25%
• Stress Measurement 25%
• Bonding Structure 25%
• Low Angle X-ray Scattering 25%

Engineering

• Root Mean Square 100%
• Rotation Speed 66%
• Microhardness 66%
• Internals 33%
• Transmissions 33%
• Ray Diffraction 33%
• Magnetron 33%
• Compressive Stress 33%
• Layer Structure 33%
• Friction Coefficient 33%
• Ray Photoelectron Spectroscopy 33%
• Multilayer Coating 33%
• Atomic Force Microscopy 33%
• Pin-on-Disc 33%
• Deposition Process 33%
• Dry Condition 33%

Material Science

• Surface Roughness 100%
• Microhardness 66%
• X-Ray Diffraction 33%
• Transmission Electron Microscopy 33%
• Chemical State 33%
• Magnetron Sputtering 33%
• X-Ray Photoelectron Spectroscopy 33%
• Titanium Dioxide 33%
• Stress Measurement 33%
• Laminate 33%